SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF
The present invention relates to a compound of the general formula (I) where: X S, SO or SO2; and one of the radicals R1 and R2 is a hydrogen atom and the other is a radical: a C1 to C18 linear or branched alkyl, optionally substituted by one or more halogen atom(s); a C2 to C18 linear or branched a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a compound of the general formula (I) where: X S, SO or SO2; and one of the radicals R1 and R2 is a hydrogen atom and the other is a radical: a C1 to C18 linear or branched alkyl, optionally substituted by one or more halogen atom(s); a C2 to C18 linear or branched alkenyl, optionally substituted by one or more halogen atom(s); an aralkyl, optionally substituted by one or more C1 to C6 alkoxy group(s); or a COR3 or CONHR3, but not simultaneously, where R3 is a radical: a C1 to C18 linear or branched alkyl, optionally substituted by one or more halogen atom(s); a C2 to C18 linear or branched alkenyl, optionally substituted by one or more halogen atom(s); an aralkyl, optionally substituted by one or more C1 to C6 alkoxy group(s); an aralkenyl, optionally substituted by one or more C1 to C6 alkoxy groups and/or one or more OH group(s); or an aryl radical, optionally substituted by one or more C1 to C6 alkoxy group(s). |
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