DEVICE FOR OBTAINING SOLID-STATE FILMS BY LASER-PLASMA METHOD

A device contains vacuum chamber, a system of pumps, hermetic windows, and laser power source located outside the chamber. Vacuum chamber houses the target material, and base-layer having holders, wherein target material and base-layer are executed rotable, and capable to change inclination angle th...

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Bibliographische Detailangaben
Hauptverfasser:	Maier, Waldemar, Bakhtiari, Habibollah, Kervalishvili, Paata
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A device contains vacuum chamber, a system of pumps, hermetic windows, and laser power source located outside the chamber. Vacuum chamber houses the target material, and base-layer having holders, wherein target material and base-layer are executed rotable, and capable to change inclination angle thereof.