Improvements relating to the treatment of polymeric materials

The heat distortion temperature of commercially available polymethacrylates is raised by subjecting the polymer to a small amount, preferably not greater than 10 Mrads., of high energy radiation, the amount of radiation being limited so as to avoid appreciable degradation of the polymer. The effect...

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Bibliographische Detailangaben
Hauptverfasser:	SIMPSON WILLIAM, WADDINGTON FRED BERRY
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR RELEVANT APPARATUS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	The heat distortion temperature of commercially available polymethacrylates is raised by subjecting the polymer to a small amount, preferably not greater than 10 Mrads., of high energy radiation, the amount of radiation being limited so as to avoid appreciable degradation of the polymer. The effect is believed to be due to the polymerization of residual monomer. The polymer may be polymethyl or polyethyl methacrylate, and the radiation is preferably an electron beam derived from a travelling wave linear accelerator. Specification 764,337, [Group XL (a)], is referred to.ALSO:The heat distortion temperature of commercially available polymethacrylates is raised by subjecting the polymer to a small amount, preferably not greater than 10 Trads, of high energy radiation, the amount of radiation being limited so as to avoid appreciable degradation of the polymer. The effect is believed to be due to the polymerization of residual monomer. The polymer may be polymethyl or polyethyl methacrylate, and the radiation is preferably an electron beam derived from a travelling wave linear accelerator. Specification 764,337 [Group XL(a)] is referred to.