Plasma foreline

An apparatus for conveying an effluent stream from a semiconductor processing tool for plasma treatment comprises a foreline conduit defining an inlet for receiving the effluent stream, and a mixing lance positioned within the foreline conduit, the mixing lance defining a mixing conduit coupled with...

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Bibliographische Detailangaben
Hauptverfasser:	Gary Peter Knight, Joanne Rachel Greenwood
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	An apparatus for conveying an effluent stream from a semiconductor processing tool for plasma treatment comprises a foreline conduit defining an inlet for receiving the effluent stream, and a mixing lance positioned within the foreline conduit, the mixing lance defining a mixing conduit coupled with first and second plasma reagent conduits for supplying first and second plasma reagents to the mixing lance, and defining a mixing lance outlet configured to deliver the mixed plasma reagent into the foreline conduit for mixing with the effluent stream. The mixing lance is preferably positioned centrally along a longitudinal axis of the foreline conduit. The apparatus may form part of a plasma abatement apparatus for removing residual fluorinated or perfluorinated compounds (PFC) from the effluent stream.