Method for single-stage treatment of siliceous subterranean formations

Methods and compositions for treating a siliceous geologic formation are described herein. An aqueous treatment composition for treating such formations includes an acid having molecular weight less than about 200, or an ammonium or sodium salt thereof, an HF source, and from about 0.1 wt% to about...

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Bibliographische Detailangaben
Hauptverfasser:	Haiyan Zhao, Patrice Abivin, Juan-Carlos Santamaria, Murtaza Ziauddin, Temiloluwa Iyenoma Yusuf
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES EARTH DRILLING EARTH DRILLING, e.g. DEEP DRILLING FIXED CONSTRUCTIONS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MINING MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR ASLURRY OF MINERALS FROM WELLS PAINTS POLISHES
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Beschreibung
Zusammenfassung:	Methods and compositions for treating a siliceous geologic formation are described herein. An aqueous treatment composition for treating such formations includes an acid having molecular weight less than about 200, or an ammonium or sodium salt thereof, an HF source, and from about 0.1 wt% to about 2.0 wt % of a fluoride scale inhibitor, the aqueous treatment composition having a pH from about 1.0 to about 3.0.