Plasma torch device component monitoring

Embodiments relating to plasma torch device component monitoring, a plasma torch device component monitoring system and a plasma torch device including such a monitoring system. A monitoring method comprises collecting electromagnetic radiation 120 generated by a plasma torch in a plasma torch devic...

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Bibliographische Detailangaben
Hauptverfasser:	Gary Peter Knight, Simone Magni, Erik Wagenaars, Neil Condon
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS TESTING
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Beschreibung
Zusammenfassung:	Embodiments relating to plasma torch device component monitoring, a plasma torch device component monitoring system and a plasma torch device including such a monitoring system. A monitoring method comprises collecting electromagnetic radiation 120 generated by a plasma torch in a plasma torch device, analysing 145/150 the collected electromagnetic radiation 120 generated by the plasma torch and comparing the analysed electromagnetic radiation generated to known electromagnetic radiation associated with one or more components, for example the anode 40, of the plasma torch device. One or more actions are triggered if the analysed emission 120 differs from the known emission. Such a monitoring method can allow for ameliorative action to be taken if degradation of one or more components, 40, forming the device is detected.