Personal care compositions

Personal care compositions are disclosed comprising a) non-sulfonate anionic surfactant, b) amphoteric surfactant, and c) at least two carboxylic acids or salts thereof, the compositions contain no more than 30% of the total wt% of a) and b) of sulfonated compounds and do not contain para-chloro-met...

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Bibliographische Detailangaben
Hauptverfasser: Ashwini Dalvi, Sarah Frances De Szalay, Jouyeop Lee, Tamika Carty, Han Choi Yew
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Personal care compositions are disclosed comprising a) non-sulfonate anionic surfactant, b) amphoteric surfactant, and c) at least two carboxylic acids or salts thereof, the compositions contain no more than 30% of the total wt% of a) and b) of sulfonated compounds and do not contain para-chloro-meta-xylenol in an amount above 0.15%wt or salicylic acid in an amount above 0.25%wt. The compositions may comprise citric acid as one of the at least two carboxylic acids or salts thereof. The compositions may comprise at least two carboxylic acids or salts having a different number of carboxylic acid groups, and the compositions comprise a higher %wt of the carboxylic acid having the lowest number of carboxylic acid groups. Cleansing and antimicrobial benefits are combined with good toleration by the skin and hair. Further disclosed is a method for providing an antimicrobial benefit to skin and/or hair by contact with said composition.