Position detection system and method of detecting a movement of a machine

A position detection system 20 comprises a first position sensor 21 that detects a change of a first magnetic field H1, generated by the movement of a machine 10, and a second position sensor 22 which detects a change of a second magnetic field H2, also generated by a movement of the machine 10, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Gerhard Bund, Stephanie Stollberger
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A position detection system 20 comprises a first position sensor 21 that detects a change of a first magnetic field H1, generated by the movement of a machine 10, and a second position sensor 22 which detects a change of a second magnetic field H2, also generated by a movement of the machine 10, and which differs from the first magnetic field H1. The detection result of the second position sensor has a lower resolution of a position of an element 13 of the machine to be determined than the detection result of the first position sensor. An evaluation device 205 evaluates at least one detection result of the first position sensor and/or at least one detection result of the second position sensor for a functional determination of the position of the element of the machine. Each of the two position sensors is connected via a separate communication connection 217, 227 to the evaluation device. Preferably the detection result of the first sensor is used to determine the position of the element within one electric turn and the detection result of the second sensor is used to determine a mechanical turn of the element. The first sensor is preferably a Tunnel magnetoresistance (TMR) sensor and the second sensor may be a parameterisable Hall sensor.