Dual gate metal-oxide-semiconductor field-effect transistor

A dual-gate metal-oxide-semiconductor field-effect transistor (MOSFET) may include a MOSFET having a channel region, a drain, and a source, a first gate formed proximate to the channel region, a drain extension region formed proximate to the drain, and a second gate formed proximate to the drain ext...

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Bibliographische Detailangaben
Hauptverfasser: Scott Warrick, Ying Ying, Justin Dougherty, Christian Larsen, Alexander Barr, Marc L Tarabbia
Format: Patent
Sprache:eng
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Zusammenfassung:A dual-gate metal-oxide-semiconductor field-effect transistor (MOSFET) may include a MOSFET having a channel region, a drain, and a source, a first gate formed proximate to the channel region, a drain extension region formed proximate to the drain, and a second gate formed proximate to the drain extension region.