Methods for treatment of a subterranean formation

The present invention relates to methods of treating subterranean formations. In various embodiments, the present invention provides a method of treating a subterranean formation including placing a first aqueous composition and a second aqueous composition in a subterranean formation. The placing i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Sharath Savari, Yogesh Kumar Choudhary
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to methods of treating subterranean formations. In various embodiments, the present invention provides a method of treating a subterranean formation including placing a first aqueous composition and a second aqueous composition in a subterranean formation. The placing includes injecting the first aqueous composition through a tubular passage in a wellbore. The placing also includes injecting the second aqueous composition through an annular passage in the wellbore.