Thermal spray assembly and method for using it

A thermal spray assembly (10, fig 1) for transforming precursor material into a layer of deposited material joined to a substrate body comprises a plasma torch 20 which produces a plasma jet from a plasma nozzle and a feeder mechanism (30, fig 1) which guides the precursor material into the plasma j...

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Bibliographische Detailangaben
1. Verfasser:	ANDREAS KRENN
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NOZZLES PERFORMING OPERATIONS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A thermal spray assembly (10, fig 1) for transforming precursor material into a layer of deposited material joined to a substrate body comprises a plasma torch 20 which produces a plasma jet from a plasma nozzle and a feeder mechanism (30, fig 1) which guides the precursor material into the plasma jet in use and is capable of providing a feeder orifice when in an open condition. The feeder mechanism is provided with a distribution chamber 36 configured for guiding moving precursor material azimuthally around the plasma torch 20, a plurality of deflector structures 38 configured for deflecting the precursor material from the distribution chamber and guiding it into a guide chamber (34, fig 1) configured for guiding the precursor material to the plasma jet in use. The deflector structures 38 are preferably arranged such that the precursor material can be deflected into the guide chamber, distributed substantially azimuthally and evenly within the whole circumference of the guide chamber. The feeder mechanism (30, fig 1) may also include a movable guide mechanism (32, fig 1) which adjusts the means distance from the plasma nozzle that the precursor material enters the plasma jet.