A method and apparatus for evacuating a vacuum process chamber
A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particle...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | INGO STEPHEN GRAHAM |
| description | A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particles, such as a cleaning stage, is performed at a relatively high vacuum. The chamber is evacuated by a vacuum pump 12 with a plurality of stages 14, 16, 18, 20, 22, 26, during the first processing step process fluid passes through only some of the stages 22 in order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust on the pump. During the second processing step the fluid passes through each of the pump stages 14, 16, 18, 20, 22, 26. Preferably chamber includes a vacuum chuck 56, for use during the first processing step, which is connected to fore-line 52 assembly were the evacuated fluid passes through all of the pump stages. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB2497957A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB2497957A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB2497957A3</originalsourceid><addsrcrecordid>eNrjZLBzVMhNLcnIT1FIzAPigoLEosSS0mKFtPwihdSyxOTSxJLMvHSFRAUQuzRXoaAoPzm1uFghOSMxNym1iIeBNS0xpziVF0pzM8i7uYY4e-imFuTHpxYXJCan5qWWxLs7GZlYmluamjsaE1YBAG9hL34</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A method and apparatus for evacuating a vacuum process chamber</title><source>esp@cenet</source><creator>INGO STEPHEN GRAHAM</creator><creatorcontrib>INGO STEPHEN GRAHAM</creatorcontrib><description>A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particles, such as a cleaning stage, is performed at a relatively high vacuum. The chamber is evacuated by a vacuum pump 12 with a plurality of stages 14, 16, 18, 20, 22, 26, during the first processing step process fluid passes through only some of the stages 22 in order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust on the pump. During the second processing step the fluid passes through each of the pump stages 14, 16, 18, 20, 22, 26. Preferably chamber includes a vacuum chuck 56, for use during the first processing step, which is connected to fore-line 52 assembly were the evacuated fluid passes through all of the pump stages.</description><language>eng</language><subject>BLASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; NON-POSITIVE DISPLACEMENT PUMPS ; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS ; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTMACHINES FOR LIQUIDS ; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTPUMPS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; WEAPONS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130703&DB=EPODOC&CC=GB&NR=2497957A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130703&DB=EPODOC&CC=GB&NR=2497957A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>INGO STEPHEN GRAHAM</creatorcontrib><title>A method and apparatus for evacuating a vacuum process chamber</title><description>A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particles, such as a cleaning stage, is performed at a relatively high vacuum. The chamber is evacuated by a vacuum pump 12 with a plurality of stages 14, 16, 18, 20, 22, 26, during the first processing step process fluid passes through only some of the stages 22 in order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust on the pump. During the second processing step the fluid passes through each of the pump stages 14, 16, 18, 20, 22, 26. Preferably chamber includes a vacuum chuck 56, for use during the first processing step, which is connected to fore-line 52 assembly were the evacuated fluid passes through all of the pump stages.</description><subject>BLASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>NON-POSITIVE DISPLACEMENT PUMPS</subject><subject>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</subject><subject>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</subject><subject>ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTMACHINES FOR LIQUIDS</subject><subject>ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTPUMPS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBzVMhNLcnIT1FIzAPigoLEosSS0mKFtPwihdSyxOTSxJLMvHSFRAUQuzRXoaAoPzm1uFghOSMxNym1iIeBNS0xpziVF0pzM8i7uYY4e-imFuTHpxYXJCan5qWWxLs7GZlYmluamjsaE1YBAG9hL34</recordid><startdate>20130703</startdate><enddate>20130703</enddate><creator>INGO STEPHEN GRAHAM</creator><scope>EVB</scope></search><sort><creationdate>20130703</creationdate><title>A method and apparatus for evacuating a vacuum process chamber</title><author>INGO STEPHEN GRAHAM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB2497957A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BLASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>NON-POSITIVE DISPLACEMENT PUMPS</topic><topic>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</topic><topic>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</topic><topic>ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTMACHINES FOR LIQUIDS</topic><topic>ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTPUMPS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>INGO STEPHEN GRAHAM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>INGO STEPHEN GRAHAM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A method and apparatus for evacuating a vacuum process chamber</title><date>2013-07-03</date><risdate>2013</risdate><abstract>A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particles, such as a cleaning stage, is performed at a relatively high vacuum. The chamber is evacuated by a vacuum pump 12 with a plurality of stages 14, 16, 18, 20, 22, 26, during the first processing step process fluid passes through only some of the stages 22 in order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust on the pump. During the second processing step the fluid passes through each of the pump stages 14, 16, 18, 20, 22, 26. Preferably chamber includes a vacuum chuck 56, for use during the first processing step, which is connected to fore-line 52 assembly were the evacuated fluid passes through all of the pump stages.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_GB2497957A |
| source | esp@cenet |
| subjects | BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY NON-POSITIVE DISPLACEMENT PUMPS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTMACHINES FOR LIQUIDS ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTPUMPS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION WEAPONS |
| title | A method and apparatus for evacuating a vacuum process chamber |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T22%3A24%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=INGO%20STEPHEN%20GRAHAM&rft.date=2013-07-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EGB2497957A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |