A method and apparatus for evacuating a vacuum process chamber
A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particle...
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Sprache: | eng |
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Zusammenfassung: | A method of evacuating a vacuum process chamber 36 in which a first processing step which produces a relatively large amount of particles, such as chemical vapour deposition CVD, is performed at a relatively low vacuum; and a second processing step which produces a relatively large small of particles, such as a cleaning stage, is performed at a relatively high vacuum. The chamber is evacuated by a vacuum pump 12 with a plurality of stages 14, 16, 18, 20, 22, 26, during the first processing step process fluid passes through only some of the stages 22 in order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust on the pump. During the second processing step the fluid passes through each of the pump stages 14, 16, 18, 20, 22, 26. Preferably chamber includes a vacuum chuck 56, for use during the first processing step, which is connected to fore-line 52 assembly were the evacuated fluid passes through all of the pump stages. |
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