MEMS capacitor devices, capacitor trimming thereof and design structures

MEMS capacitor devices, capacitor trimming thereof and design structures

Micro-electro-mechanical structure (MEMS) capacitor devices, capacitor trimming for MEMS capacitor devices, and design structures are disclosed. The method includes identifying a process variation related to a formation of micro-electro­mechanical structure (MEMS) capacitor devices across a substra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHRISTOPHER VINCENT JAHNES, ANTHONY K STAMPER
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
CAPACITORS
CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
RESONATORS
TRANSPORTING
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Beschreibung
Zusammenfassung:Micro-electro-mechanical structure (MEMS) capacitor devices, capacitor trimming for MEMS capacitor devices, and design structures are disclosed. The method includes identifying a process variation related to a formation of micro-electro­mechanical structure (MEMS) capacitor devices across a substrate. The method further includes providing design offsets or process offsets in electrode areas of the MEMS capacitor devices across the substrate, based on the identified process variation. This method compensates for the variance in capacitance during fabrication of the MEMS capacitors across an array of capacitors on a single substrate.