Method and apparatus for surface processing of a substrate using an energetic particle beam

Method and apparatus for processing a substrate (44) with an energetic particle beam (42). Features (66) on the substrate (44) are oriented relative to the energetic particle beam (42) and the substrate (44) is scanned through the energetic particle beam (42). The substrate (44) is periodically inde...

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Bibliographische Detailangaben
Hauptverfasser:	PIERO SFERLAZZO, ROBERT KRAUSE, IRA REISS, VIKTOR KANAROV, BORIS DRUZ, ROGER P FREMGEN, ALAN V HAYES
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Method and apparatus for processing a substrate (44) with an energetic particle beam (42). Features (66) on the substrate (44) are oriented relative to the energetic particle beam (42) and the substrate (44) is scanned through the energetic particle beam (42). The substrate (44) is periodically indexed about its azimuthal axis (45) of symmetry, while shielded from exposure to the energetic particle beam (42), to reorient the features (66) relative to the major dimension (49) of the beam (42).