Polishing composition for glass substrate

The present invention provides a polishing composition for a glass substrate, containing a silica having an average particle size of primary particles of from 1 to 100 nm, a polymer having a sulfonic acid group, and water; a process for manufacturing a glass substrate with the polishing composition...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	KAZUHIKO NISHIMOTO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOTECHNOLOGY NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention provides a polishing composition for a glass substrate, containing a silica having an average particle size of primary particles of from 1 to 100 nm, a polymer having a sulfonic acid group, and water; a process for manufacturing a glass substrate with the polishing composition for a glass substrate; and a process for reducing surface stains of a glass substrate with the polishing composition for a glass substrate. The polishing composition for a glass substrate can be suitably used in the manufacture of, for example, glass hard disks, aluminosilicate glass for reinforced glass substrates, and glass ceramic substrate (crystallized glass substrate), and the like. The polymer may be an acrylic acid/sulfonic acid copolymer, and the silica may be a colloidal silica.