Integrated circuit with adjustable resistor

A resistor comprises a region of resistive material 12 with a plurality of conductive contacts or plugs 44A, 44B in electrical contact with the resistive material 12 through an overlying dielectric layer. A first and a second interconnect line 42A, 42B are formed overlying the plugs 44A, 44B and in conductive contact with one or more of the plugs 44A, 44B, such that a portion of the resistive material 12 between the first and second interconnect lines 42A, 42B provides a desired resistance. The conductive contacts 44A, 44B are formed using a first photolithographic mask and the first and second interconnect lines 42A, 42B are formed using a second photolithographic mask. The desired resistance is changed by modifying the either mask such that one of more dimensions of a region of the resistive material 12 between the first and second interconnect lines 42A, 42B is altered.