Improvements to showerheads

A showerhead for substrate processing including a gas inlet leading to a gas reservoir. A faceplate including a plurality of orifices is fitted between the reservoir and a processing space. The showerhead further includes a sheet including a plurality of orifices, the sheet orifices being smaller in...

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Bibliographische Detailangaben
1. Verfasser:	OLE SCHLOTTMAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A showerhead for substrate processing including a gas inlet leading to a gas reservoir. A faceplate including a plurality of orifices is fitted between the reservoir and a processing space. The showerhead further includes a sheet including a plurality of orifices, the sheet orifices being smaller in size than the minimum diameter of the faceplate orifices. The sheet is fitted in or on the showerhead such that the fluid passes to the process space from the reservoir via the sheet orifices.