Apparatus and method for analysing a material library

A device for analyzing a materials library includes at least one radiation source for electromagnetic radiation, which is positioned in front of the materials library, and at least two flat detectors operating in parallel, which are operable using high-sensitivity resolution and of which one is sensitive to electromagnetic radiation of a first wavelength range and the other is sensitive to electromagnetic radiation of a second wavelength range. Moreover, a method for analyzing a materials library in which the materials library is simultaneously tested using at least two methods in which electromagnetic radiation of different wavelength ranges is used. The beam is split behind the materials library as a function of wavelength and is deflected in the direction of at least two flat sensors operating using high-sensitivity resolution.