Creating layers in thin-film structures

A layer of a material is created in a thin-film structure by coating a substrate 14 in one pass with an ink having a major, fugitive component 13 and at least one minor, non-fugitive component 12 and treating the ink to expel the major component 13 to leave the layer 15 of material. The layer 15 may...

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Hauptverfasser: WARREN LEE, MICHAEL STUART WAITE, RICHARD ALLAN TUCK, ADRIAN PAUL BURDEN
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creator WARREN LEE
MICHAEL STUART WAITE
RICHARD ALLAN TUCK
ADRIAN PAUL BURDEN
description A layer of a material is created in a thin-film structure by coating a substrate 14 in one pass with an ink having a major, fugitive component 13 and at least one minor, non-fugitive component 12 and treating the ink to expel the major component 13 to leave the layer 15 of material. The layer 15 may be an electrically insulating layer having a thickness in the range 0.5 to 10 micrometres, with the ink containing non-fugitive colloidal ceramic nanoparticles having a size in the range 10 to 100 nanometres. The layer 15 may be a process control layer, such as an etch stop layer or barrier layer. The layer 15 may be an optically emissive layer or a layer of predetermined electrical conductivity.
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The layer 15 may be an electrically insulating layer having a thickness in the range 0.5 to 10 micrometres, with the ink containing non-fugitive colloidal ceramic nanoparticles having a size in the range 10 to 100 nanometres. The layer 15 may be a process control layer, such as an etch stop layer or barrier layer. 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The layer 15 may be an electrically insulating layer having a thickness in the range 0.5 to 10 micrometres, with the ink containing non-fugitive colloidal ceramic nanoparticles having a size in the range 10 to 100 nanometres. The layer 15 may be a process control layer, such as an etch stop layer or barrier layer. The layer 15 may be an optically emissive layer or a layer of predetermined electrical conductivity.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
ARTIFICIAL STONE
CEMENTS
CERAMICS
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMICAL PAINT OR INK REMOVERS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS
CONCRETE
CORRECTING FLUIDS
DIFFUSION TREATMENT OF METALLIC MATERIAL
DYES
FILLING PASTES
GLASS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INKS
JOINING GLASS TO GLASS OR OTHER MATERIALS
LIME, MAGNESIA
METALLURGY
MINERAL OR SLAG WOOL
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
REFRACTORIES
SLAG
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TREATMENT OF NATURAL STONE
USE OF MATERIALS THEREFOR
WOODSTAINS
title Creating layers in thin-film structures
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