Creating layers in thin-film structures
A layer of a material is created in a thin-film structure by coating a substrate 14 in one pass with an ink having a major, fugitive component 13 and at least one minor, non-fugitive component 12 and treating the ink to expel the major component 13 to leave the layer 15 of material. The layer 15 may...
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Zusammenfassung: | A layer of a material is created in a thin-film structure by coating a substrate 14 in one pass with an ink having a major, fugitive component 13 and at least one minor, non-fugitive component 12 and treating the ink to expel the major component 13 to leave the layer 15 of material. The layer 15 may be an electrically insulating layer having a thickness in the range 0.5 to 10 micrometres, with the ink containing non-fugitive colloidal ceramic nanoparticles having a size in the range 10 to 100 nanometres. The layer 15 may be a process control layer, such as an etch stop layer or barrier layer. The layer 15 may be an optically emissive layer or a layer of predetermined electrical conductivity. |
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