Improvements in materials

A boron trioxide material having a softening point of less than 350 DEG C and a rate of softening exceeding 100 mu m/m/ DEG C above 360 DEG C is especially suitable as an encapsulant for semiconductor crystal drawing.

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1. Verfasser: RODERICK GORDON LESTER BARNES
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creator RODERICK GORDON LESTER BARNES
description A boron trioxide material having a softening point of less than 350 DEG C and a rate of softening exceeding 100 mu m/m/ DEG C above 360 DEG C is especially suitable as an encapsulant for semiconductor crystal drawing.
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subjects AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
CHEMISTRY
CRYSTAL GROWTH
METALLURGY
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
title Improvements in materials
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