RADIATION-SENSITIVE POLYMER COMPOSITION

A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two -SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.

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Bibliographische Detailangaben
Hauptverfasser:	HIDETO SOTOBAYASHI, WINFRIED WUNDERLICH, WOLFRAM SCHNABEL, FRITHJOF ASMUSSEN, PETER QUIS
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two -SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.