Photosensitive formaldehyde-sulphonamide resins

Photosensitive polymers contain repeating units where R represents a substituted or unsubstituted aryl residue or a heterocyclic residue, e.g. a furyl residue and n = 1 or 2. They are prepared by first reacting p-acetyl-benzene sulphamide with an aldehyde R(CH = CH)nCHO in which R is an aryl or a f...

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Bibliographische Detailangaben
Hauptverfasser:	GUZZI ALBERTO, BOSIO ROBERTO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Photosensitive polymers contain repeating units where R represents a substituted or unsubstituted aryl residue or a heterocyclic residue, e.g. a furyl residue and n = 1 or 2. They are prepared by first reacting p-acetyl-benzene sulphamide with an aldehyde R(CH = CH)nCHO in which R is an aryl or a furyl residue and n = 0, 1 or 2. The resulting compound is then reacted with an aqueous solution of HCHO to obtain the photosensitive polymers.