PROCEDE DE FABRICATION D'UNE ELECTRODE TRANSPARENTE PAR GRAVURE A TRAVERS UN MASQUE DE MICROBILLES

The method involves depositing a silicon nitride coating or a transparent enamel (2) on a transparent substrate (1). The silicon nitride coating or enamel is covered by a single layer of microspheres (3) to form a mask of microspheres. The silicon nitride coating or the enamel is engraved by high index reactive ions through the mask of microspheres. The microspheres are removed to expose the engraved surface of coating or enamel. A metal layer (7) is deposited on the engraved surface. The metalized engraved surface is subjected to polishing. The polished surface is covered by a transparent conducting coating.