PROCEDE ET DISPOSITIF DE DEPOT CHIMIQUE EN PHASE GAZEUSE D'UN FILM POLYMERE SUR UN SUBSTRAT

A method for chemical vapor deposition of a polymer film onto a substrate (6), includes the following two separate, consecutive steps:-a step for the photon activation of the gas phase wherein photon activation energy (42, 43) is provided to at least one gaseous polymer precursor that is present in...

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Bibliographische Detailangaben
Hauptverfasser:	VINSONNEAU SYLVIE, MAURY FRANCIS, SANTUCCI VIRGINIE, SENOCQ FRANCOIS, BIVER CLAUDINE
Format:	Patent
Sprache:	fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for chemical vapor deposition of a polymer film onto a substrate (6), includes the following two separate, consecutive steps:-a step for the photon activation of the gas phase wherein photon activation energy (42, 43) is provided to at least one gaseous polymer precursor that is present in a mainly gaseous composition, and-a chemical vapor deposition step wherein the activated gaseous polymer precursor, from the photon activation step, is deposited onto a substrate (6) so as to form a polymer film on the substrate, the total gas phase pressure ranging from 102 to 105 Pa. A device (1) for using such a method is also described.