PROCEDE DE FABRICATION DE COUCHES DE POLISSAGE DE PATIN DE POLISSAGE CHIMIQUE -MECANIQUE AYANT DES DEFAUTS D'INCLUSION DE GAZ REDUITS

A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.

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Bibliographische Detailangaben
Hauptverfasser:	LIBBERS PAUL, TRACY JONATHAN, VERBARO DAVID, GEIGER ANDREW M, ESBENSHADE JOHN, NOVEMBER SAMUEL J, SACCHETTI PAUL J, WATKINS MICHAEL E
Format:	Patent
Sprache:	fre
Schlagworte:	GRINDING MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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Beschreibung
Zusammenfassung:	A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.