DISPOSITIFS GENERATEURS DE PLASMA MICRO-ONDES ET TORCHES A PLASMA

The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supp...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ROSTAING JEAN CHRISTOPHE, MOISAN MICHEL, GUERIN DANIEL, ZAKRZEWSKI ZENON
Format:	Patent
Sprache:	fre
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.