Reactive spraying method for coating substrate, e.g. with titanium oxynitride, includes introducing reactive gas into spray chamber at flow rate determined by cyclic control signal

In a method for coating a substrate by reactive spraying of a metal source, where a plasma forming gas and first and second reactive gases are introduced into the spray chamber under the action of flow control signals, at least the first reactive gas is introduced at a flow rate corresponding to a c...

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Hauptverfasser:	STEINMANN PIERRE ALBERT, ROUSSELOT CHRISTOPHE, PETITJEAN CARINE, LE DREO HERVE, REBOUTA LUIS, MARTIN NICOLAS, POLCAR THOMAS, BANAKH OKSANA, KAPPL HERBERT, FENKER MARTIN, CARVALHO PEDRO, VAZ FILIPE, LINTYMER JAN, STHAL FABRICE, PARREIRA NUNO, GRAFOUTE MOUSSA, CAVALEIRO ALBANO
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	In a method for coating a substrate by reactive spraying of a metal source, where a plasma forming gas and first and second reactive gases are introduced into the spray chamber under the action of flow control signals, at least the first reactive gas is introduced at a flow rate corresponding to a cyclic control signal. Independent claims are included for (1) apparatus for carrying out the process, comprising an injector for each of the plasma forming gas and first and second reactive gases; a controller for generating opening-closing signals for each of the injectors; and a regulator for introducing the first reactive gas at a flow rate corresponding to a cyclic control signal; and (2) a titanium oxynitride-based coating, having a chemical composition distributed around compounds of formula TixOyNz (I). x : 0.4(y)2> - 0.6y + 0.5; z : (z)2> + 0.2z + 0.3; x : 0.32-0.50. L'invention concerne un procédé de dépôt de revêtement sur un substrat par pulvérisation réactive d'une source métallique, comprenant les étapes consistant à introduire dans une chambre de pulvérisation, sous l'action de signaux de commandes de débits respectifs :- un gaz plasmagène,- un premier gaz réactif, et- un deuxième gaz réactif, différent du premier.Ce procédé est essentiellement caractérisé en ce qu'au moins le premier gaz réactif est introduit selon un débit correspondant à un signal de commande cyclique.L'invention porte également sur le dispositif de mise en oeuvre et sur un revêtement à base d'oxynitrure de titane dont la composition chimique est distribuée autour des composés de la forme Tix"Oy"Nz", avec les concentrations atomiques suivantes :X" = 4.10.Y" -6.10.Y" + 5.10X" = Z" +2.10.Z" + 3.10avec X" compris entre 0,32 et 0,50.