TAMPON DE POLISSAGE BIAISE RADIALEMENT ET PROCEDE DE POLISSAGE L'UTILISANT

A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less...

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1. Verfasser:	MULDOWNEY GREGORY P
Format:	Patent
Sprache:	fre
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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creator	MULDOWNEY GREGORY P
description	A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less than 50mu m. An independent claim is included for substrate polishing method.
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The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less than 50mu m. An independent claim is included for substrate polishing method.</abstract><oa>free_for_read</oa></addata></record>
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subjects	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
title	TAMPON DE POLISSAGE BIAISE RADIALEMENT ET PROCEDE DE POLISSAGE L'UTILISANT
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