TAMPON DE POLISSAGE BIAISE RADIALEMENT ET PROCEDE DE POLISSAGE L'UTILISANT

TAMPON DE POLISSAGE BIAISE RADIALEMENT ET PROCEDE DE POLISSAGE L'UTILISANT

A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less...

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Bibliographische Detailangaben
1. Verfasser: MULDOWNEY GREGORY P
Format: Patent
Sprache:fre
Schlagworte:
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TOOLS FOR GRINDING, BUFFING, OR SHARPENING
TRANSPORTING
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Beschreibung
Zusammenfassung:A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less than 50mu m. An independent claim is included for substrate polishing method.