PROCEDE DE DEPOT D'UNE COUCHE AMORPHE CONTENANT MAJORITAIREMENT DU FLUOR ET DU CARBONE ET DISPOSITIF CONVENANT A SA MISE EN OEUVRE

A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least o...

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Bibliographische Detailangaben
Hauptverfasser: BOSMANS RICHARD, SCHERER KARIN, LACAN PASCALE
Format: Patent
Sprache:fre
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Zusammenfassung:A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least one compound containing fluorine and carbon in a gaseous form or saturated vapor supplied to the ion canon. A method of this type makes it possible, in particular, to improve the adherence of an outer layer having a low index of refraction to the underlying layer of an anti-reflective stack. A device suited for carrying out the method is also described.