$Deposition of an amorphous layer mainly containing fluorine and carbon on an optical substrate, notably for the production of low refractive index ophthalmic lenses$

Deposition of an amorphous layer mainly containing fluorine and carbon on an optical substrate, notably for the production of low refractive index ophthalmic lenses

The deposition under vacuum of an amorphous layer containing mainly fluorine and carbon is carried out using an ion canon able to eject ions in the form of a beam of accelerated ions created from at least one compound containing the fluorine and carbon in the form of a gas or a saturated vapor feedi...

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Bibliographische Detailangaben
Hauptverfasser:	SCHERE KARINE, BOSMANS RICHARD, LACAN PASCALE
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The deposition under vacuum of an amorphous layer containing mainly fluorine and carbon is carried out using an ion canon able to eject ions in the form of a beam of accelerated ions created from at least one compound containing the fluorine and carbon in the form of a gas or a saturated vapor feeding the ion canon. An independent claim is also included for a device for putting this method into service. L'invention a pour objet un procédé de dépôt sous vide d'une couche fluorée amorphe sur un substrat (9), caractérisé en ce qu'il comporte l'étape de dépôt de cette couche au moyen d'un canon à ions (1) propre à éjecter des ions fluorés sous forme d'un faisceau d'ions accélérés créé à partir d'au moins un composé fluoré sous forme gazeuse ou de vapeur saturante alimentant le canon à ions.Un tel procédé permet notamment d'améliorer l'adhérence d'une couche extérieure à bas indice de réfraction sur la couche sous-jacente d'un empilement anti-reflets.L'invention a également trait à un dispositif convenant à la mise en oeuvre de ce procédé.