Characterisation method for photorepeater
The standard reticle is produced which defines at least three and preferably five identical reference patterns which are non aligned and preferably at the four corners and centre. The reticle is then placed successively in each photorepeater and various regions of a standard plate are illuminated wi...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | ANDRE SANDRINE WEILL ANDRE |
| description | The standard reticle is produced which defines at least three and preferably five identical reference patterns which are non aligned and preferably at the four corners and centre. The reticle is then placed successively in each photorepeater and various regions of a standard plate are illuminated with various doses of light (ID). The dimensions of the reference patterns in the different regions (CD) are measured and plotted against the illuminating light dose (ID). An interpolation (IL) is made and may be used to find the dose for each photorepeater such that all patterns will have the same dimension.
L'invention concerne un procédé de caractérisation d'au moins un photorépéteur et d'un même ensemble de motifs réalisé sur plusieurs régions d'une plaquette, consistant à réaliser un réticule étalon définissant au moins une première série d'au moins trois motifs témoins identiques, non alignés; à insoler successivement plusieurs régions d'une plaquette étalon en faisant varier la dose d'éclairement (ID) d'une région à l'autre; à mesurer les dimensions respectives (CD) des motifs témoins obtenus sur les différentes régions de la plaquette pour déterminer, pour chaque dose d'éclairement, la dimension moyenne des motifs témoins; et à effectuer une interpolation linéaire (IL) de ces dimensions moyennes. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_FR2755238A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>FR2755238A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_FR2755238A13</originalsourceid><addsrcrecordid>eNrjZNB0zkgsSkwuSS3KLE4syczPU8hNLcnIT1FIyy9SKMjIL8kvSi1ITQTK8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeLcgI3NTUyNjC0dDYyKUAADxJSjs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Characterisation method for photorepeater</title><source>esp@cenet</source><creator>ANDRE SANDRINE ; WEILL ANDRE</creator><creatorcontrib>ANDRE SANDRINE ; WEILL ANDRE</creatorcontrib><description>The standard reticle is produced which defines at least three and preferably five identical reference patterns which are non aligned and preferably at the four corners and centre. The reticle is then placed successively in each photorepeater and various regions of a standard plate are illuminated with various doses of light (ID). The dimensions of the reference patterns in the different regions (CD) are measured and plotted against the illuminating light dose (ID). An interpolation (IL) is made and may be used to find the dose for each photorepeater such that all patterns will have the same dimension.
L'invention concerne un procédé de caractérisation d'au moins un photorépéteur et d'un même ensemble de motifs réalisé sur plusieurs régions d'une plaquette, consistant à réaliser un réticule étalon définissant au moins une première série d'au moins trois motifs témoins identiques, non alignés; à insoler successivement plusieurs régions d'une plaquette étalon en faisant varier la dose d'éclairement (ID) d'une région à l'autre; à mesurer les dimensions respectives (CD) des motifs témoins obtenus sur les différentes régions de la plaquette pour déterminer, pour chaque dose d'éclairement, la dimension moyenne des motifs témoins; et à effectuer une interpolation linéaire (IL) de ces dimensions moyennes.</description><edition>6</edition><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980430&DB=EPODOC&CC=FR&NR=2755238A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980430&DB=EPODOC&CC=FR&NR=2755238A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ANDRE SANDRINE</creatorcontrib><creatorcontrib>WEILL ANDRE</creatorcontrib><title>Characterisation method for photorepeater</title><description>The standard reticle is produced which defines at least three and preferably five identical reference patterns which are non aligned and preferably at the four corners and centre. The reticle is then placed successively in each photorepeater and various regions of a standard plate are illuminated with various doses of light (ID). The dimensions of the reference patterns in the different regions (CD) are measured and plotted against the illuminating light dose (ID). An interpolation (IL) is made and may be used to find the dose for each photorepeater such that all patterns will have the same dimension.
L'invention concerne un procédé de caractérisation d'au moins un photorépéteur et d'un même ensemble de motifs réalisé sur plusieurs régions d'une plaquette, consistant à réaliser un réticule étalon définissant au moins une première série d'au moins trois motifs témoins identiques, non alignés; à insoler successivement plusieurs régions d'une plaquette étalon en faisant varier la dose d'éclairement (ID) d'une région à l'autre; à mesurer les dimensions respectives (CD) des motifs témoins obtenus sur les différentes régions de la plaquette pour déterminer, pour chaque dose d'éclairement, la dimension moyenne des motifs témoins; et à effectuer une interpolation linéaire (IL) de ces dimensions moyennes.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB0zkgsSkwuSS3KLE4syczPU8hNLcnIT1FIyy9SKMjIL8kvSi1ITQTK8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeLcgI3NTUyNjC0dDYyKUAADxJSjs</recordid><startdate>19980430</startdate><enddate>19980430</enddate><creator>ANDRE SANDRINE</creator><creator>WEILL ANDRE</creator><scope>EVB</scope></search><sort><creationdate>19980430</creationdate><title>Characterisation method for photorepeater</title><author>ANDRE SANDRINE ; WEILL ANDRE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_FR2755238A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>1998</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ANDRE SANDRINE</creatorcontrib><creatorcontrib>WEILL ANDRE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ANDRE SANDRINE</au><au>WEILL ANDRE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Characterisation method for photorepeater</title><date>1998-04-30</date><risdate>1998</risdate><abstract>The standard reticle is produced which defines at least three and preferably five identical reference patterns which are non aligned and preferably at the four corners and centre. The reticle is then placed successively in each photorepeater and various regions of a standard plate are illuminated with various doses of light (ID). The dimensions of the reference patterns in the different regions (CD) are measured and plotted against the illuminating light dose (ID). An interpolation (IL) is made and may be used to find the dose for each photorepeater such that all patterns will have the same dimension.
L'invention concerne un procédé de caractérisation d'au moins un photorépéteur et d'un même ensemble de motifs réalisé sur plusieurs régions d'une plaquette, consistant à réaliser un réticule étalon définissant au moins une première série d'au moins trois motifs témoins identiques, non alignés; à insoler successivement plusieurs régions d'une plaquette étalon en faisant varier la dose d'éclairement (ID) d'une région à l'autre; à mesurer les dimensions respectives (CD) des motifs témoins obtenus sur les différentes régions de la plaquette pour déterminer, pour chaque dose d'éclairement, la dimension moyenne des motifs témoins; et à effectuer une interpolation linéaire (IL) de ces dimensions moyennes.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre |
| recordid | cdi_epo_espacenet_FR2755238A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Characterisation method for photorepeater |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T12%3A53%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ANDRE%20SANDRINE&rft.date=1998-04-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EFR2755238A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |