Alkylating highly disperse silicon dioxide - after steaming to desired degree of wetting

Highly disperse SiO2-alkyl prods. (I) are prepd. by alkylating highly disperse SiO2 with alkyl chlorosilane vapours in a turbulent layer process. SiO2-alkyl prod. obtd. is then sepd. from the gaseous reaction prods. at 390-400 degrees C. The novelty is that the highly disperse SiO2 is steam treated...

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1. Verfasser:	ALEXEI ALEXEEVICH CHUIKO, VALENTIN ANATOLIEVICH TERTYKH, VILYAM ALEXANDROVICH SOBOLEV, VALERY MIKHAILOVICH MASCHENKO, VYACHESLAV VALENTINOVICH PAVLOV, ALEXEI DMITRIEVICH CHUGAI, NIKOLAI VASILIEVICH KHABER, ANATOLY BORISOVICH KONDRATENKO, VASILY IVANOVICH VATAMANJUK, MIKHAIL IVANOVICH KHOMA, ALEXANDR NIKOLAEVICH KUTIN, JURY DAVYDOVICH SHAPOSHNIKOV ET MALVINA
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS POLISHES PREPARATION OF CARBON BLACK TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES
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