ULTRA HIGH PURITY CONDITIONS FOR ATOMIC SCALE PROCESSING

An apparatus for atomic scale processing is provided. The apparatus comprising a reactor (100) having inner and outer surfaces; wherein at least a portion of the inner surfaces define an internal volume (156) of the reactor (100); a fixture assembly (158) positioned within the internal volume (156)...

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Bibliographische Detailangaben
Hauptverfasser:	O'TOOLE, Noel, CARLSEN, Daniel, RAYNER, Gilbert
Format:	Patent
Sprache:	eng ; fin
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An apparatus for atomic scale processing is provided. The apparatus comprising a reactor (100) having inner and outer surfaces; wherein at least a portion of the inner surfaces define an internal volume (156) of the reactor (100); a fixture assembly (158) positioned within the internal volume (156) of the reactor (100) having a surface configured to hold a substrate within the internal volume (156) of the reactor (100); and an inductively coupled plasma source. The inductively coupled plasma source and the reactor (100) are connected at a first connection point (112). A base pressure of the reactor (100) is between approximately 10-4 and 10-2 Torr. A partial pressure of each background impurity within the internal volume (156) of the reactor (100) is below approximately 10-6 Torr to reduce said background impurities role in surface reactions before, during and after atomic scale processing.