Polyfluorialkaanien käyttö ponnekaasuina

Use of polyfluoroalkanes of the formula CX3-CY2-R (I> in which X radicals on the same C atom stand for hydrogen and/or fluorine, Y radicals on the same C atom stand for hydrogen, fluorine and/or CF3 and R stands for CH2F, CHF2, CH3, CF3, CF2-CH3, CF2CH2F, CH2-CH3, CH2-CH2-CH3 or -CH(CH3)-CH3 and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MARHOLD,ALBRECHT, NEGELE,MICHAEL, BIELEFELDT,DIETMAR, SOMMERFELD,CLAUS-DIETER, LAMBERTS,WILHELM
Format: Patent
Sprache:fin ; swe
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Zusammenfassung:Use of polyfluoroalkanes of the formula CX3-CY2-R (I> in which X radicals on the same C atom stand for hydrogen and/or fluorine, Y radicals on the same C atom stand for hydrogen, fluorine and/or CF3 and R stands for CH2F, CHF2, CH3, CF3, CF2-CH3, CF2CH2F, CH2-CH3, CH2-CH2-CH3 or -CH(CH3)-CH3 and a molecule of the formula (I) contains at least two fluorine atoms, as propellant gases. o