METHOD FOR MEASURING OPTICAL ABERRATIONS WITH VARIABLE RANGE AND SENSITIVITY USING TWO RECONFIGURABLE OPTICAL ELEMENTS, AND DEVICE FOR PERFORMING SAME

The invention relates to a method for measuring optical aberrations with variable range and sensitivity using two reconfigurable optical elements and to a device for performing same. The wavefront (A) to be analysed hits a sampling sub-system (1) that includes a reconfigurable optical element (11) which provides an irradiance pattern (P) that has a controllable position and shape and can be used to measure the aberration. According to the invention, a sub-system (2), which contains another reconfigurable optical element (21), forms an image (I) of the pattern (P) on a fixed plane (3). A detector (4) is disposed on said plane and connected to an analysis sub-system (5) which calculates the aberration (F) of the front (A). A sub-system (6) controls the properties of the reconfigurable elements (11 and 21). Consequently, it is not necessary for the detector to be moved mechanically in order to place same in the variable position in which the pattern (P) is formed. Procedimiento para la medida de aberraciones ópticas con rango y sensibilidad variables mediante dos elementos ópticos reconfigurables y dispositivo para su realización. El frente de onda a analizar (A) incide sobre un subsistema de muestreo (1), que incluye un elemento óptico reconfigurable (11) que proporciona un patrón de irradiancia (P) de posición y geometría controlables, adecuado para medir la aberración. Un subsistema (2), que contiene otro elemento óptico reconfigurable (21), forma una imagen (I) del patrón (P) sobre un plano fijo (3). Sobre dicho plano se ubica un detector (4), conectado a un subsistema de análisis (5), que calcula la aberración (F) del frente (A). Un subsistema (6) controla las propiedades de los elementos reconfigurables (11) y (21). No es así necesario efectuar desplazamientos mecánicos del detector para situarlo en la posición variable donde se forma el patrón (P).