MONTAJE PARA EL REVESTIMIENTO DE SUSTRATOS UTILIZANDO UN DISPOSITIVO DE PULVERIZACION

LA INVENCION SE REFIERE A UN DISPOSITIVO DE PULVERIZACION PARA RECUBRIMIENTO REACTIVO DE SUBSTRATOS, DONDE LA POTENCIA ELECTRICA GUIADA AL ELECTRODO DE PULVERIZACION OSCILA ENTRE DOS VALORES. AMBOS VALORES DE POTENCIA SON ELEGIDOS DE TAL MODO, QUE EN LA MISMA AFLUENCIA DE GAS REACTIVO EL OBJETIVO DE...

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Hauptverfasser:	TESCHNER, GOTZ, SZCZYRBOWSKI, JOACHIM, ZMELTY, ANTON, BRUCH, JURGEN, MARQUARDT, DIETMAR
Format:	Patent
Sprache:	spa
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	LA INVENCION SE REFIERE A UN DISPOSITIVO DE PULVERIZACION PARA RECUBRIMIENTO REACTIVO DE SUBSTRATOS, DONDE LA POTENCIA ELECTRICA GUIADA AL ELECTRODO DE PULVERIZACION OSCILA ENTRE DOS VALORES. AMBOS VALORES DE POTENCIA SON ELEGIDOS DE TAL MODO, QUE EN LA MISMA AFLUENCIA DE GAS REACTIVO EL OBJETIVO DEL ELECTRODO DE PULVERIZACION SE ENCUENTRA EN EL PRIMER VALOR DE POTENCIA EN UN MODO METALICO, MIENTRAS QUE EN EL SEGUNDO VALOR DE POTENCIA SE ENCUENTRA EN MODO DE OXIDO. The apparatus includes a process space (2) with reactive gas supply (15, 16), and at least one electrode (20, 21) connected to an electric supply unit (34) in such a way that the discharge voltage of the electrode depends on the rate of reactive gas supplied. The apparatus further includes a device for switching between two values (P1, P2) the electric power supplied to the electrode. These two values are chosen so that the target(22, 23) - for the same reactive gas flow - for first value (P1) is in a metallic mode, while for the second value (P2) it is in a oxidic mode. Also claimed is a method for establishing an operating point for the proposed apparatus.