Radio frequency wave guide anti multipactor coating method consists of electron bombardment with simultaneous argon inert ions administration under controlled conditions

The radio frequency wave guide anti-multipactor coating technique comprises application of a 4 kV d.c. 100 mA electron gun, with simultaneous administration of 0.25 mA/cm2 200 eV kinetic energy argon inert ions. Operating in a nitrogen atmosphere at 3 x 10-4 mmHg and 40 A/minute deposition rate the...

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Hauptverfasser: RUEDA SANCHEZ FERNANDO, DIAZ RIVILLAS NURIA, GALAN ESTELLA LUIS, MONTERO HERRERO ISABEL, RABOSO VAQUERO DAVID, CASTANEDA QUINTANA SAUL
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Sprache:eng ; spa
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Zusammenfassung:The radio frequency wave guide anti-multipactor coating technique comprises application of a 4 kV d.c. 100 mA electron gun, with simultaneous administration of 0.25 mA/cm2 200 eV kinetic energy argon inert ions. Operating in a nitrogen atmosphere at 3 x 10-4 mmHg and 40 A/minute deposition rate the substrate is at 100degreesC. The basic pressure is 4 x 10-8 mmHg, and the deposition pressure is 3 x 10-4 to 4.5 x 10-4 mmHg. The radio frequency wave guide anti-multipactor coating technique comprises application of a 4 kV d.c. 100 mA electron gun, with simultaneous administration of 0.25 mA/cm2 200 eV kinetic energy argon inert ions. Operating in a nitrogen atmosphere at 3 x 10-4 mmHg and 40 A/minute deposition rate the substrate is at 100degreesC. The basic pressure is 4 x 10-8 mmHg, and the deposition pressure is 3 x 10-4 to 4.5 x 10-4 mmHg. (Machine-translation by Google Translate, not legally binding) Procedimiento para la obtención de recubrimientos antimultipactor aplicables a guías de onda de radiofrecuencia realizado con una fuente de cañón de electrones de 4KV DC y 100 mA, con la necesaria asistencia simultánea de iones inertes de argón de 0.25 mA/cm{sup,2} y 200 eV de energía cinética, en atmósfera de nitrógeno a 3 x 10{sup,-4} Torr y una velocidad de depósito de 40 A/minuto, con una presión base de 4 x 10{sup,-8} Torr y una presión de depósito de 3 x 10{sup,-4} Torr a 4.5 x 10{sup,-4} Torr, encontrándose el substrato a 100ºC.