Glass substrate coated with silica mfr. - with grains of silica encrusted in the surface coating

Glass substrate is covered with a layer of SiO having grains of silica encrusted in its thickness to give it an irregular surface. The grains are 20-500 nm. The layer is formed by blowing onto the heated glass plate substrate from a multiorifice nozzle gaseous molecules contg. Si atoms and an oxidis...

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Bibliographische Detailangaben
Hauptverfasser: HYODOH MISONOU MASEO M, KAWAHARA HIDEO, HIRATA MASAHIRO
Format: Patent
Sprache:eng ; spa
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Zusammenfassung:Glass substrate is covered with a layer of SiO having grains of silica encrusted in its thickness to give it an irregular surface. The grains are 20-500 nm. The layer is formed by blowing onto the heated glass plate substrate from a multiorifice nozzle gaseous molecules contg. Si atoms and an oxidising gas diluted with inert gases. The concns. of gaseous molecules contg. Si, the oxidising gas and the mixt. gas and the rate of flow of each gas are controlled. The molecules of Si contg. gas and oxygen are made to start to react between the exits of the nozzle and the substrate, such on depositing on the substrate the components have not yet completely reacted so that the layer deposited is encrusted with grains of silica produced by the partial reaction, so as to form the irregular surface. Glass substrate is covered with a layer of SiO having grains of silica encrusted in its thickness to give it an irregular surface. The grains are 20-500 nm. The layer is formed by blowing onto the heated glass plate substrate from a multiorifice nozzle gaseous molecules contg. Si atoms and an oxidising gas diluted with inert gases. The concns. of gaseous molecules contg. Si, the oxidising gas and the mixt. gas and the rate of flow of each gas are controlled. The molecules of Si contg. gas and oxygen are made to start to react between the exits of the nozzle and the substrate, such on depositing on the substrate the components have not yet completely reacted so that the layer deposited is encrusted with grains of silica produced by the partial reaction, so as to form the irregular surface. (Machine-translation by Google Translate, not legally binding) LA INVENCION SE REFIERE A UNA CAPA DE SILICE DE SUPERFICIE IRREGULAR DEPOSITADA SOBRE UN SUSTRATO, EN PARTICULAR DE VIDRIO Y PRODUCTO DE OBTENCION. PROPONE SOPLAR REACTIVOS GASEOSOS EN DIRECCION DEL SUSTRATO CALENTADO CON UNOS FLUJOS Y PROPORCIONES TALES QUE TENGA LUGAR UNA REACCION PARCIAL CONDUCIENDO A LA FORMACION DE GRANOS DE SILICE ANTES DEL ENCUENTRO CON EL SUSTRATO, INCRUSTANDOSE ESTOS GRANOS DE SILICE EN LA CAPA QUE SE FORMA SOBRE EL SUSTRATO CON LOS REACTIVOS RESTANTES. RESULTA DE ELLO UNA CAPA DE REVESTIMIENTO DE SUPERFICIE IRREGULAR, UTILIZABLE EN PARTICULAR EN LAS PILAS SOLARES.