IN-LIQUID POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

IN-LIQUID POSTURE TURNING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

An in-liquid posture turning apparatus for turning a posture of a plurality of substrates, the apparatus including: an immersion tank; a reversing chuck; an opening/closing drive mechanism; a rotating drive mechanism; and a lifting drive mechanism that moves the reversing chuck up and down between a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: IWASAKI, Akihiro, TANIGUCHI, Shinichi
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An in-liquid posture turning apparatus for turning a posture of a plurality of substrates, the apparatus including: an immersion tank; a reversing chuck; an opening/closing drive mechanism; a rotating drive mechanism; and a lifting drive mechanism that moves the reversing chuck up and down between a transfer position above the immersion tank and a turning position in the immersion tank, in which in a state where the reversing chuck is moved up to the transfer position, the reversing chuck, which has been set to an open position, is made to receive a plurality of substrates, and after the inversion chuck is set to a holding position, in a state where the inversion chuck is moved down to the turning position, the reversing chuck is driven around a horizontal axis.