FIRST HOLDING DEVICE, THIRD HOLDING DEVICE, FIFTH HOLDING DEVICE, CONVEYANCE SYSTEM, EXPOSURE SYSTEM, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

An exposure system is an exposure system capable of exposing a wafer transported from a coating apparatus capable of coating a photosensitive material onto the wafer, including: a holding apparatus which includes a first holding part holding a first surface of the wafer transported from the coating apparatus; a measurement apparatus which includes a first measurement part having at least a first measurement region and capable of measuring a position in a first direction of a second surface on the side opposite to the first surface of the wafer held by the first holding part and a second measurement part having at least one second measurement region different from the first measurement region and capable of measuring a position in the first direction of the first surface or the second surface of the wafer; an exposure apparatus which exposes the wafer with an energy beam; a transport apparatus which transports the wafer from the measurement apparatus to the exposure apparatus; and a control apparatus, wherein the control apparatus determines whether or not the wafer is to be transported toward the exposure apparatus by the transport apparatus based on a measurement result of the first measurement part and a measurement result of the second measurement part.