GAS SENSOR AND METHOD OF MANUFACTURING THE GAS SENSOR
A gas sensor (100) comprising: a black silicon substrate (102) comprising silicon protrusions (104); a layer of nanostructures (106) arranged on the silicon protrusions, wherein the nanostructures are configured to interact with a predetermined substance in a gas; a first electrode (108) arranged in...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A gas sensor (100) comprising: a black silicon substrate (102) comprising silicon protrusions (104); a layer of nanostructures (106) arranged on the silicon protrusions, wherein the nanostructures are configured to interact with a predetermined substance in a gas; a first electrode (108) arranged in electrical connection with the black silicon substrate; and a second electrode (110) arranged above and at a distance from the nanostructures and configured to receive a field emission current being emitted by the silicon protrusions and nanostructures resulting from a voltage applied across the first and second electrodes. |
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