COUPLED ETCHING AND DEPOSITION PROCESS AND CAPACITOR FOIL FORMED BY THE PROCESS
The present application addresses a coupled etching and deposition process and a capacitor foil formed by the process. According to the coupled etching and deposition process an anodic reaction is coupled to a cathodic reaction, such that in the anodic reaction a first foil containing a metal is ele...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present application addresses a coupled etching and deposition process and a capacitor foil formed by the process. According to the coupled etching and deposition process an anodic reaction is coupled to a cathodic reaction, such that in the anodic reaction a first foil containing a metal is electrochemically etched in an electrolyte whereby ions of the metal are dissolved into the electrolyte and whereby in the cathodic reaction ions of the metal from the electrolyte are deposited on a second foil. |
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