HEXAPOD-BASED PEDESTAL SYSTEMS FOR USE IN SEMICONDUCTOR PROCESSING OPERATIONS

Semiconductor processing tools with hexapod-based pedestal systems are disclosed and described. Such hexapod pedestal systems may incorporate a hexapod mechanism with a stationary mount that is connected via six linear actuators with a movable mount. The movable mount may support a pedestal located within a semiconductor processing chamber. The hexapod mechanism may be controlled so as to allow the pedestal to shift laterally so as to center the pedestal on a wafer supported by a wafer handling robot, as well as to angularly align a wafer supported thereby with the underside of a showerhead and to allow a wafer supported thereby to be subjected to any of a variety of movements during wafer processing operations that may promote increased wafer uniformity.