AUXILIARY PLASMA SOURCE FOR ROBUST IGNITION AND RESTRIKES IN A PLASMA CHAMBER

AUXILIARY PLASMA SOURCE FOR ROBUST IGNITION AND RESTRIKES IN A PLASMA CHAMBER

A semiconductor processing system may include a semiconductor processing chamber configured to execute a recipe on a semiconductor wafer. The system may include a first plasma source to provide plasma to the semiconductor processing chamber and to be duty cycled during an execution of the recipe. Th...

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Bibliographische Detailangaben
Hauptverfasser: ACHKASOV, Kostiantyn, SILVEIRA, Fernando M, RAMASWAMY, Kartik, YANG, Yang, GUO, Yue, BRIGHT, Nicolas J
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Zusammenfassung:A semiconductor processing system may include a semiconductor processing chamber configured to execute a recipe on a semiconductor wafer. The system may include a first plasma source to provide plasma to the semiconductor processing chamber and to be duty cycled during an execution of the recipe. The system may also include a second plasma source configured to maintain the plasma in the semiconductor processing chamber while the first plasma source is duty cycled.