SYSTEM AND METHOD FOR FABRICATING HOLOGRAPHIC OPTICAL ELEMENTS USING POLARIZATION HOLOGRAM MASTER

A system includes a light outputting element configured to output a first beam propagating toward a beam interference zone from a first side of the beam interference zone. The system also includes a wavefront shaping assembly disposed at a second side of the beam interference zone and including a po...

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Bibliographische Detailangaben
Hauptverfasser:	SONG, Hyunmin, LEIBOVICI, Matthieu Charles Raoul, LEE, Yun-Han, JANG, Changwon, OH, Chulwoo
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHOTOGRAPHY PHYSICS PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	A system includes a light outputting element configured to output a first beam propagating toward a beam interference zone from a first side of the beam interference zone. The system also includes a wavefront shaping assembly disposed at a second side of the beam interference zone and including a polarization hologram, the wavefront shaping assembly being configured to reflect the first beam as a second beam propagating toward the beam interference zone from the second side. The first beam and the second beam are linearly polarized beams, and are configured to interfere with one another within the beam interference zone to generate an interference pattern that is recordable in a recording medium layer disposed in the beam interference zone.