PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHARGED PARTICLE APPARATUS

Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a b...

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Bibliographische Detailangaben
Hauptverfasser: SARS, Gerardus, Wilhelmus, URBANUS, Willem Henk, PHILIPS, Patrick, Peter, Hubert, Helena, BOSCH, Niels, Johannes, Maria, SANS MERCADER, Joan, GRASMAN, Jasper, Hendrik, HEMPENIUS, Peter, Paul, BUTLER, Hans
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.