A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED APPARATUSES

Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining substrate measurement data describing spatial variation of a substrate parameter; and fitting a model to said substrate measurement data to obtain a fitted model; wherei...

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Bibliographische Detailangaben
Hauptverfasser:	MAYANK, Mayank, HULSEBOS, Edo, Maria, ROOZE, Joost
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining substrate measurement data describing spatial variation of a substrate parameter; and fitting a model to said substrate measurement data to obtain a fitted model; wherein said fitting step comprises regularizing the fitting using a plurality of regularization parameters, said plurality of regularization parameters having been individually optimized to penalize spatial components of said substrate measurement data in accordance with their effect on a parameter of interest.